The Micro Engineering 's X-ray scanner DEX02, an exposure system for deep X-ray lithography , ensures maximum precision in the production of microstructures. Through shadow projection of a mask relief into a radiation sensitive material it forms highly precise structures fully automatically. DEX02 was specifically designed for LIGA-applications .
The integrated optical overlay system allows multiple exposures and thus generation of stepped structures. These can be created even in the most exotic geometries because the tilt and rotate modules permit oblique exposures and rotation around th ebeam axis.
The entirely new concept of this equipment ensures the utmost flexibility. DEX02 can be deployed on differnt radiation sources and with variable coupling. Exposures are possible both in a vacuum and under atmospheric pressure.
The particular strength of the DEX02 deep X-ray lithography scanner is the production of three-dimensional microstructures with large aspect ratio.
